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High purity copper (Cu) sputtering target 99.995%,99.9999%
High purity copper (Cu) sputtering target 99.995%,99.9999%
Supplier Info
[China Supplier]
Contact Person : Ms. Zhao Alice
Tel : 86-10-82830276
Fax : 86-10-62923013
Product Detail
1. High density 2. Low impurity content 3. Microstructure:Uniform 4. Surface: machine plane / polished 5. ISO9001: 2008

Item Name

High purity copper (Cu) target

Purity

99.995%~99.9999%

Shape

Flat/rotary target, according to your request

Available size

Round: dia 25~300mm,Thickness:3~10mm

Rectangular: Length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Vacuum Melting, Patented thermo-mechanical process

Application

Widely used in coating processing industries

A: Solar Photovoltaic Appication.

B: Electronic and Semiconductor Appication.

C: Decoration and Coating Appication. etc.

Quality Standard (99.995% Cu)

Element

Value(≤ppm)

Element

Value(≤ppm)

P

1

Ni

1

Bi

1

Pb

1

Sb

1

Sn

1

As

1

S

1

Fe

2

O

20

Zn

1

Quality Standard (99.9999% Cu)

Element

Value(≤ppm)

Element

Value(≤ppm)

Ag

0.5

Ni

0.05

Al

0.3

P

0.02

As

0.02

Pb

0.01

Bi

0.02

Si

0.3

Ca

0.1

Sn

0.05

Cd

0.1

Th

0.001

Cl

0.1

Ti

0.3

Cr

0.05

U

0.001

Fe

0.1

V

0.05

Ga

0.05

Zn

0.2

K

0.02

C

20

Li

0.02

S

5

Mg

0.2

O

10

Mn

0.05

N

1

Na

0.02

High purity copper (Cu) sputtering target 99.995%,99.9999%

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