I-ZnO sputtering target High density, high even, sputtering process is stability, provide bonding services.

I-ZnO sputtering target

the purity is more than 99.99% ,

the relative density is more than 99%.

The size is as following:

The plate sputtering target:

all size within 600*300mm*20mm

The cylinder sputtering target:

the diameter:50-400mm

the thickness:5-20mm

the height:50-500mm.

I-ZnO sputtering target