GZO sputtering target Our GZO sputtering target is high density, high even low electric resistance, sputtering process is stab

GZO sputtering target

The GZO sputtering target made by balen have following characteristics:

the purity is more than 99.99% ,

the relative density is more than 99%.

The size is as following:

The plate sputtering target:

all size within 600*300mm*20mm

The rotary GZO sputtering target:

the diameter:50-400mm

the thickness:8-20mm

the height:50-300mm.

GZO sputtering target