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Thermal Positve Offset CTP Plate
Thermal Positve Offset CTP Plate
Supplier Info
[China Supplier]
Contact Person : Mr. Wang Eric
Tel : 86-028-66459849
Fax : 86-028-86282845
Product Detail
Easy exposure and procesing. Compatible with most of the thermal plates and developers available on the market.
BENEFITS 
Easy exposure and procesing.Compatible with most of the thermal plates and developers available on the market.Maximun resolution for the reproduction of stochastic screensFast ink-water balance.Enhanced constrast and stability.Runs more than 100.000 impresions without baking.Cost-efective. CTP-A plate meets user's needs and optimize the printing perfomance.
Technical Characteristics
Thermal positive plate to operate in CTP systems with infrared (IR) laser diode between 800-850 nm. No pre-heat required. Anodized non-image area.

Exposure / CoatingCoating colour: blue intenseContrast after development: very highDay light sensitivity: up to 2 hours exposure does not affect the plateSpectral sensitivity: 800-850 nm. Peak sensitivity at 830 nm.Compatible with most of the thermal platesetters: Creo, Heidelberg, Screen, Lüscher, etc...Required energy: 120-130 mj/cm2Image reproduction: 1-99 % at 250 lines per inch and FM screeningDevelopmentUse developer Revelith-CTP at 23oC ± 1ºCCompatible with most of the thermal plate developers on the marketDevelopment time: 30 seconds ± 5 secondsReplenishment: with the same developer at 120-140 ml/m2GummingUse Gomalux-LPWhen hardened by baking, apply Quemagum-LPDeletionUse deletion pens Dualpoint-LPBakingHardening the coating by baking enables very long runs, over 500.000 impressions, depending on press conditions.Apply Quemagum-LPBaking conditions: Static oven: 200-230°C during 5-6 minutes                          On-line oven: 230-250°C during 3-4 minutes

Thermal Positve Offset CTP Plate

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