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TiAl Target TiAl alloy sputtering target
TiAl Target Used as sputtering target Atom Ration:50:50,75:25 or customer designs Purity:99.8% min Relative Density:3.7g/cm3 TiAl Target Used as sputtering target for coating toolsAtom Ration: 50:50, 75:25 or according to customer designsPurity: TiAl 99.8% min.Relative Density: 98%Roughness: 3.2umPressing Method: Smelting, HIP TiAl Target TiAl alloy sputtering target
Aluminum Silicon Alloy Target (AlSi alloy target)
... Silicon Alloy Target 1)Si: 1wt % 2)alloy purity 99.9-99.9995% Aluminum Silicon Alloy Target (Al-Si alloy target):1.Processing technology: vacuum smelting2.Alloy ... Dimensions: (Various kinds of forms of alloy target materials) (1).Dartboard target: Dia<=250mm(2).Quadrate target: <=700x200mm, ply is no limited. ... inquiries are typically within 24 hours. Aluminum Silicon Alloy Target (AlSi alloy target)
Supplier: Huizhou Boguan Vacuum Applied Materials Co., Ltd. [China Manufacturers]
Gr4 titanium target for Solar energy industry
... controlled,ensuring our clients get the best products. Gr4 titanium target for Solar energy industry
Supplier: Baoji Tian Xing Minor Metal Materials Co., Ltd. [China Manufacturers]

zirconium target

Nov 02, 2012
zirconium target
... .Grade:R60702,R60704 R60705 Zr2 Zr43.purity:99.6%Zirconium target:Zirconium target, we have zirconium patent and quality certification system.physical ... will be a good choice for you purchasing products. zirconium target
Supplier: Baoji City Zhong Yu De Titanium Industry Co., Ltd. [China Manufacturers]

sputtering target

Mar 02, 2012
sputtering target
... laser implosions of spherical shell TI-AL TARGET TI-ZI TARGET TI-MO TARGET TI-CH TARGET TI-ALLOY TARGETAbsorption-spectroscopy measurements using an embedded ... the EXAFS spectrum indicating cold titanium close to peak compression. sputtering target
Supplier: Xi'an Space Star Technology (Group) Corporation [China Manufacturers]

titanium target

May 13, 2012
titanium target
titanium target 1.Material: Gr2 2.Size:135*90mm or accordng ... target:We produces various pure metal targets, such as Cr, Ni, Ti, Zr, Cu, Al, etc. The alloy targets, such as TiAl alloy, TiZr alloy ... , NiCr alloy, NiV alloy, etc. All these targets have the characteristic ... to the custormer's requirement to process. titanium target
Supplier: Baoji Xinnuo New Metal Materials Co., Ltd. [China Manufacturers]
round titanium target
... Titanium Target 1.Sputtering/ Coating material2.Dia.100~400mm Height 20~1000mm3.ASTM B381, ASTM B3484.MOQ: 10piecePure Titanium TargetTitanium alloy targetUsed for sputtering ... ,Ti-67Al,Ti-70Al Cr-50Al,Cr-70AlSpecification: Square/ Round Target Dia. 100~400mm Height. 20~1000mm Customers request sizes are ...
Supplier: Shaanxi Taipu Rare Metal Materials Limited Company [China Manufacturers]
Target material made of plasma spraying production line
... target materials, alloy sputtering film coating target materials, ceramic sputtering film coating target materials, boron carbide ceramic sputtering target materials, carbide ceramic sputtering target materials, ceramic sputtering fluoride target materials, nitride ceramic sputtering target ...
Supplier: Guangzhou Sanxin Metal S & T Co., Ltd. [China Manufacturers]
Zinc Sputtering Targets
high purity (99.9%~99.99.99999%) sputtering targets for your research use. Zinc Alloy Sputtering targetsWe regularly provide high purity (99.9%~99 ... .999%) sputtering targets for your research use. Zinc Sputtering Targets, Zinc alloy Target (Purity: 99.9% - 99.999% )Material ... of made to orde, Any inquiry for high performance of sputtering targets please contact us. Zinc ...
Supplier: Wuxi Toko New Material Technology Co., Ltd. [China Manufacturers]

Sputtering Targets

Feb 06, 2012
Sputtering Targets
... , RO5252(Ta-2.5W), RO5255(Ta-10W) Size: Tantalum sputtering target,Tantalum alloy targetMaterial: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W ... .0050.0030.002110.0060.0020.040.0150.0050.00150.006 Sputtering Targets
Supplier: Hangzhou Keen Technology Co., Ltd. [China Manufacturers]
Definitely seamless pipe for industrial & medicals
... biomedical implants, biocompatibility Titanium Grade 7 (Titanium Palladium alloy, Ti-IIPd) Keyword: UNS R52400, Ti-IIPd ... when changing shape. Titanium-Niobium Alloy ( TiNb alloy, NbTi alloy) Keywords: TiNb alloy, NbTi alloy, superconducting, ASTM B884 Niobium- ... ( TiO2, Ti2O3, Ti3O5 ) 10. Typical Sputtering Targets Titanium-Aluminum (TiAl alloy) sputtering target Composition: Ti: Al 75: 25 at%, 65 ...
hot rolled 99.95% molybdenum plate and sheet
... molybdenum alloy materialsmolybdenum sheet molybdenum plate molybdenum alloy sheet molybdenum molybdenum foil molybdenum alloy foilmolybdenum mesh molybdenum alloy meshmolybdenum boat molybdenum alloy boatmolybdenum target molybdenum alloy targetmolybdenum ...
Supplier: Shaanxi Yuan Hong Metal Products Co., Ltd. [China Manufacturers]
Nickel Chromium(NiCr) sputtering target 99.9%,99.95%
... textureLow impurity contentBetter heat dissipationHigh Tensile strength Nickel Chromium(NiCr) sputtering target 99.9%,99.95%
magnetron sputtering target vacuum coating materials vacuum coating consumption material
1.TiAl: Atomic ratio 25:75 2.TiAlSi:Atomic ratio 30:60: ... 25:75 4.CrAlSi:Atomic ratio 30:60:10 Staple target kindsConstituent and puritySpecification TiTA0(99.8%)¢100×40mmTiTA1(99.5 ... :10¢100×40mm OtherClintheriform and tubular shape etc.Customize magnetron sputtering target vacuum coating materials vacuum coating consumption material
Supplier: Beijing Logon Sci. & Tech. Deve. Co., Ltd. [China Manufacturers]
W-Ti Sputtering Target
... -99.995≥99<10Ø400×40≤1.6Applications:Tungsten titanium alloy sputtering target can be used to make the semiconductor chips, the new ... the ceramic thin film circuit’s diffusion barrier. W-Ti Sputtering Target
Titanium sputtering target
... sputtering target: titanium target 1.Material:Gr1 2.Size:295*110*20 Titanium sputtering target: titanium targetType: Squre target, Length 500mm~600mm Width: 200mm~300mm Round Target ... need.(4)Warmly welcome you send inquiry to us! Titanium sputtering target
sputtering target material
Magnetron-controlled sputtering coating target material Specification:Pure molybdenum,titanium,nickel target, Ni80Cr20, 316L Magnetron-controlled sputtering coating target materialSpecification: molybdenum,titanium,nickel target, Ni80Cr20, 316L sputtering target material
Tantalum sputtering target
Tantalum sputting target material : Ta . purity : >=99.95% grade :3N 3N5 surface finish :16Rms max or customer's MTantalum sputting targetcircular target : dia. from 25 to 350mm width : from 3 to 28mmrectangular targets : thickness : 1mm to 12.5mm widthness : max 600mm length : :max 1500mmsize tolerance : +-0.02 on all dimesionssurface : 6sides or 4sides polish Tantalum sputtering target
Supplier: Baoji Linuo Non-Ferrous Metal Co., Ltd. [China Manufacturers]
100*40mm ti sputtering titanium target
... *40 Dia80*503.Application : titanium target is windly used for coated glass , galvanize,sputtering, electrochemistry4.Shape : titanium round target , titanium planar target5.Characteristic ... : homogeneous structure/ Low-weight/ Non-corrsion/ good Strength 100*40mm ti sputtering titanium target ...
Supplier: Baoji Ying Titanium Metal Materials Co., Ltd. [China Manufacturers]
supply titanium sputtering target
... sputtering target Size:dia(50-900)mm, height (40-100)mm Standard: ASTM B348/381, AMS4928 ISO9001:2000 in stock now titanium target ... .0150.300.25//0.12~0.25//bal supply titanium sputtering target
Supplier: Baoji Fengze Metal Material Co., Ltd. [China Manufacturers]

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