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High purity Tungsten (W) sputtering targets 99.95%
High purity Tungsten (W) sputtering targets 99.95%
Supplier Info
[China Supplier]
Contact Person : Ms. Zhao Alice
Tel : 86-10-82830276
Fax : 86-10-62923013
Product Detail
1. High density 2. Low impurity content 3. Microstructure:Uniform 4. Surface: machine plane / polished 5. ISO9001: 2008

Item Name

High purity Tungsten (W) target

Purity

99.99%

Shape

Flat/rotary target, according to your request

Available size

Round: dia 25~300mm, Thickness:3~10mm

Rectangular: Length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Hot isostatic pressing

Application

Widely used in coating processing industries

A: Electronic and Semiconductor Application.

B: Decoration and Coating Application. etc.

 

   Quality Standard (99.99% W)

Element

Value (<ppm)

Element

Value (<ppm)

Fe

5

Mo

10

Ni

3

P

1

Al

2

C

5

Si

3

O

3

Ca

3

N

3

Mg

2

High purity Tungsten (W) sputtering targets 99.95%

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